Note: Fast and reliable fracture strain extraction technique applied to silicon at nanometer scale

Passi, Vikram;Bhaskar, Umesh Kumar;Pardoen, Thomas;Sodervall, Ulf;Raskin, Jean-Pierre;et.al.
(2011) Review of Scientific Instruments — Vol. 82, p. 116106 (2011)

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Authors
  • Passi, VikramUCLouvain
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  • Bhaskar, Umesh KumarUCLouvain
    Author
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  • Sodervall, UlfChalmers University of Technology, Göteborg, Sweden
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Abstract
Simple fabrication process and extraction procedure to determine the fracture strain of monocrystalline silicone are demonstrated. Nanowires/nanoribbons in silicon are fabricated and subjected to uniaxial tensile stress along the complete length of the beams. Large strains up to 5% are measured for nanowires presenting a cross section of 50 nm x 50 nm and a length of 2.5 μm. An increase in fracture strain for silicon nanowires (NWs) with the downscaling of their volume is observed, highlighting the reduction of the defects probability as volume is decreased.
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Citations

Passi, V., Bhaskar, U. K., Pardoen, T., Sodervall, U., Nilsson, B., Petersson, G., Hagberg, M., & Raskin, J.-P. (2011). Note: Fast and reliable fracture strain extraction technique applied to silicon at nanometer scale. Review of Scientific Instruments, 82, 116106. https://doi.org/10.1063/1.3655464 (Original work published 2011)