A SPDT RF switch small- and large-signal characteristics on TR-HR SOI substrates

Kazemi Esfeh, Babak;Makovejev S.;Allibert F.;Raskin, Jean-Pierre
(2017) IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference — Location: San Francisco, USA (16.October.2017)

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Authors
  • Kazemi Esfeh, Babakorcid-logoUCLouvain
    Author
  • Makovejev S.Incize, Louvain-la-Neuve, Belgium
    Author
  • Allibert F.Soitec, Bernin, France
    Author
  • Author
Abstract
This paper evaluates the small- and large-signal characteristics of a single pole double thru (SPDT) RF antenna switch including its insertion loss, isolation and non-linear behavior. It is fabricated on two different types of high resistivity (HR) Silicon-on- Insulator (SOI) substrates: one standard (HR-SOI) and one trap-rich (RFeSI80). Using a special test structure, the contribution of substrate and active devices is separated for both in small- and large-signal. It is shown that by using trap-rich substrate technology, a reduction of more than 17 dB of 2nd harmonic is achieved compared with HR SOI substrate.
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Citations

Kazemi Esfeh, B., Makovejev S., Allibert F., & Raskin, J.-P. (2017). A SPDT RF switch small- and large-signal characteristics on TR-HR SOI substrates. Proceedings of the IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, p. paper #11.2. https://hdl.handle.net/2078.5/226930