Materials characterization of WNxCy, WNx and WCx films for advanced barriers

Volders, H.; Tokei, Z.; Bender, H.; Brijs, B.; Caluwaerts, R.; Carbonell, L.; Conard, T.; Drijbooms, C.; Franquet, A.; Garaud, S.; Hoflijk, I.; Moussa, A.; Sinapi, F.; Travaly, Y.; Vanhaeren, D.; Vereecke, G.; Zhao, C.; Li, W.-M.; Sprey, H.; Jonas, Alain

doi:10.1016/j.mee.2007.05.023

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