TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn
(2013) Surface and Interface Analysis — Vol. 45, n° 1, p. 178-180 (2013)
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- The performance of Cs+, C60 + and Ar n + (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs +, the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C60 +. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar1700 + clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value. Copyright © 2012 John Wiley & Sons, Ltd. Copyright © 2012 John Wiley & Sons, Ltd.
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Wehbe, N., Tabarrant, T., Brison, J., Mouhib, T., Delcorte, A., Bertrand, P., Moellers, R., Niehuis, E., & Houssiau, L. (2013). TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn. Surface and Interface Analysis, 45(1), 178-180. https://doi.org/10.1002/sia.5121 (Original work published 2013)