Plasma polymerization of C4Cl6 and C 2H2Cl4 at atmospheric pressure
(2013) Polymer — Vol. 54, n° 16, p. 4085-4092 (2013)
Files
121-Hubert-Delcorte-Reniers-2013Polymer.pdf
Restricted Access - Adobe PDF
- 1.23 MB
Details
- Authors
- Abstract
- In the present study, the feasibility of synthesizing chlorinated films by a dielectric barrier discharge at atmospheric pressure is assessed. Two different liquid monomers (hexachlorobuta-1,3-diene C4Cl6 and 1,1,1,2-tetrachloroethane C2H2Cl4) are tested and results show that organic coatings rich in chlorine can be deposited. The correlation and complementarity of water contact angle, X-ray photoelectron spectroscopy, secondary ion mass spectrometry and ellipsometry techniques have provided information to compare the properties of the perchlorinated layers built up from monomers with different Cl/C ratios and hydrogen concentrations. The bond dissociation energies of C-Cl2, C-Cl and C-C/CC/C-H are used to provide an explanation for the differences in films structure recorded by X-ray photoelectron spectroscopy and secondary ion mass spectrometry. Finally, dynamic-secondary ion mass spectrometry complemented by ellipsometry is used to calculate a deposition rate ranging from 40 to 70 nm/min depending on the plasma conditions. These measurements also show a good homogeneity of the film throughout its thickness. © 2013 Published by Elsevier Ltd.
- Affiliations
Citations
Hubert, J., Poleunis, C., Delcorte, A., Laha, P., Bossert, J., Lambeets, S., Ozkan, A., Bertrand, P., Terryn, H., & Reniers, F. (2013). Plasma polymerization of C4Cl6 and C 2H2Cl4 at atmospheric pressure. Polymer, 54(16), 4085-4092. https://doi.org/10.1016/j.polymer.2013.05.068 (Original work published 2013)