A new technique unique to SOI MOSFETs is presented for extracting the physical device dimensions (effective gate length and gate oxide and film thicknesses) from a set of gate capacitance measurements on transistors with various lengths.
Flandre, D., & Gentinne, B. (1993). Extraction of Physical Device Dimensions of Soi Mosfets From Gate Capacitance Measurements. Electronics Letters, 29(7), 586-588. https://doi.org/10.1049/el:19930393 (Original work published 1993)