Nanoporous thin films from self-assembled metallo-supramolecular block copolymers
(2005) Advanced Materials — Vol. 17, n° 9, p. 1162-1165 (2005)
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- Abstract
- Nanoporous thin polymer films have been produced by a simple two-step approach using metallo-supramolecular block copolymers as the starting materials. The first step is the self-assembly of the copolymer, yielding cylindrical microdomains oriented normal to the substrate. The second step involves the opening of the metal-ligand complex located at the junction of the two blocks by redox chemistry to release the minor block and create the pores (see Figure).
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Fustin, C.-A., Lohmeijer, B., Duwez, A., Jonas, A., Schuhert, U., & Gohy, J.-F. (2005). Nanoporous thin films from self-assembled metallo-supramolecular block copolymers. Advanced Materials, 17(9), 1162-1165. https://doi.org/10.1002/adma.200402073 (Original work published 2005)