Gate-All-Around Technology for Harsh Environment Applications
(1999) 1999 NASA/JPL conference on Electronics for Extreme Environments — Location: Pasadena (USA) (9.February.1999)
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Colinge, J.-P., Vandooren, A., & Flandre, D. (1999). Gate-All-Around Technology for Harsh Environment Applications. Proceedings of the 1999 NASA/JPL conference on Electronics for Extreme Environments. 1999 NASA/JPL conference on Electronics for Extreme Environments, Pasadena (USA). https://hdl.handle.net/2078.5/253268