FinFET: a mature multi-gate MOS technology ? A wideband transistor simulation and characterization approach
(2005) SINANO Workshop 2005 — Location: Grenoble (France) (16.September.2005)
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Raskin, J.-P., Dixit, A., Collaert, N., Rudenko, T., Chung, T. M., Flandre, D., Kilchytska, V., & Lederer, D. (2005). FinFET: a mature multi-gate MOS technology ? A wideband transistor simulation and characterization approach. Proceedings of the SINANO Workshop 2005, Paper n° 5, 21 pages. https://hdl.handle.net/2078.5/253242