Formation of TiN/CoSi2 barrier layer on thin-film SOI for high-temperature applicationsChen, J.;Colinge, Jean-Pierre;Flandre, Denis;Nguyen, B.-Y.;Rai, R.;et.al.(1997) Conference HITEN 1997 — Location: Manchester (UK) (15.September.1997)
FilesNo attached file found for this publication.DetailsAuthorsChen, J.UCLouvainAuthorColinge, Jean-PierreUCLouvainAuthorFlandre, DenisUCLouvainAuthorNguyen, B.-Y.UCLouvainAuthorHegde, R.UCLouvainAuthorRai, R.UCLouvainAuthorShow more AffiliationsUCLouvainFSA/ELEC - Département d'électricitéShow moreCitations APA Chicago FWB Chen, J., Colinge, J.-P., Flandre, D., Nguyen, B.-Y., Hegde, R., & Rai, R. (1997). Formation of TiN/CoSi2 barrier layer on thin-film SOI for high-temperature applications. Proceedings of HITEN 1997, 159-164. https://hdl.handle.net/2078.5/253211