Liquid Helium Temperature Analog Operation of Asymmetric Self-Cascode FD SOI MOSFETs

de Souza, Michelly;Kilchytska, Valeriya;Flandre, Denis;Pavanello, Marcelo Antonio
(2012) 2012 IEEE International SOI Conference — Location: Napa (USA) (1.October.2012)

Files

LiquidHeliumTemperatureAnalogOperationofAsymmetricSelf-CascodeFDSOIMOSFETs.pdf
  • Restricted Access
  • Adobe PDF
  • 320.51 KB

Details

Authors
  • de Souza, MichellyCentro Universitario da FEI, Brazil
    Author
  • Author
  • Author
  • Pavanello, Marcelo AntonioCentro Universitario da FEI, Brazil
    Author
Abstract
Fully Depleted (FD) SOI technology is well known to provide improved analog performance of CMOS transistors [1, 2]. However, FD SOI transistors may suffer from parasitic bipolar effects (PBE) that cause the degradation of the output conductance [3]. The use of cascode transistors with common gate (making a self-cascode – SC topology) has been shown to reduce the output conductance of MOSFETs, while keeping some advantages of long-channel transistors [4]. Fig. 1 represents the self-cascode transistor, composed by transistors MS and MD, with channel lengths LS and LD, and threshold voltages VT,S and VT,D, respectively (with VT,S = VT,D in the symmetric SC– S-SC).Recent works [5, 6] showed that the use of different threshold voltages (VT) for MS and MD (so-called asymmetric self-cascode – A-SC) is able to further enhance the analog properties of SC n- and pMOS transistors, in comparison to the S-SC, at room temperature (RT). In this paper the enhanced analog performance of asymmetric SC structure is experimentally demonstrated at deep cryogenic environments emphasizing its capability to minimize (or even suppress) PBE in FD SOI n- and p-type MOSFETs at liquid helium temperature (LHT), where this effect is more pronounced.
Affiliations

Citations

de Souza, M., Kilchytska, V., Flandre, D., & Pavanello, M. A. (2012). Liquid Helium Temperature Analog Operation of Asymmetric Self-Cascode FD SOI MOSFETs. Proceedings of the 2012 IEEE International SOI Conference, 2. https://doi.org/10.1109/SOI.2012.6404377