Unusual gate current transient behavior in SOI MOSFETs

Bawedin, Maryline;Cristoloveanu, Sorin;Flandre, Denis
(2005) 2005 IEEE International SOI Conference — Location: Hawaii (USA) (3.October.2005)

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  • Bawedin, MarylineUCLouvain
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  • Cristoloveanu, SorinIMEP, Grenoble
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  • Author
Abstract
We report unusual gate current variations with gate bias and time in accumulation regime. Measurements and simulations show the importance of the time-dependent floating body potential in both partially and fully depleted SOI MOSFETs. These variations during front-gate voltage scan and the resulting transient gate current are discussed as a combination of several mechanisms such as capacitive coupling, SRH generation, band-to-band tunneling and impact ionization. The gate current behavior is important for EEPROMs and depends on the device geometry and operating conditions.
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Bawedin, M., Cristoloveanu, S., & Flandre, D. (2005). Unusual gate current transient behavior in SOI MOSFETs. In IEEE (ed.), Proceedings of the 2005 IEEE International SOI Conference (pp. 67-69). https://doi.org/10.1109/SOI.2005.1563536