Metal electrodes integration on macroporous silicon: pores distribution and morphology

Scheen, Gilles;Bassu, Margherita;Francis, Laurent
(2012) Nanoscale Research Letters — Vol. 7, n° 395 (2012)

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Abstract
In this work, a new approach for the one-step integration of interdigitated electrodes on macroporous silicon substrates is presented. Titanium/gold interdigitated electrodes are used to pattern p-type silicon substrates prior the anodization in an organic electrolyte. The electrolyte characteristics, conductivity, and pH have been found to affect the adherence of the metal layer on the silicon surface during the electrochemical etching. The impact of the metal pattern on size distribution and morphology of the resulting macroporous silicon layer is analyzed. A formation mechanism supported by finite element simulation is proposed.
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Scheen, G., Bassu, M., & Francis, L. (2012). Metal electrodes integration on macroporous silicon: pores distribution and morphology. Nanoscale Research Letters, 7(395). https://doi.org/10.1186/1556-276X-7-395 (Original work published 2012)