Cohesive zone based modelling of Si/Si and SiO2/SiO2 interfaces in the presence of ductile interlayersBertholet, Y.;Raskin, Jean-Pierre;Pardoen, Thomas(2005) 11th International Conference on Fracture — Location: Turin (Italy) (20.March.2005)
FilesNo attached file found for this publication.DetailsAuthorsBertholet, Y.AuthorRaskin, Jean-PierreUCLouvainAuthorPardoen, ThomasUCLouvainAuthorAffiliationsUCLouvainFSA/ELEC - Département d'électricitéUCLouvainFSA/MAPR - Département des sciences des matériaux et des procédésShow moreCitations APA Chicago FWB Bertholet, Y., Raskin, J.-P., & Pardoen, T. (2005). Cohesive zone based modelling of Si/Si and SiO2/SiO2 interfaces in the presence of ductile interlayers. Proceedings of ICH11, p. 5087. https://hdl.handle.net/2078.5/230612