Porous Silicon: when void enables new Si application fieldsScheen, G.;Rasson, J.;Belaroussi, Y.;Poncelet, O.;Francis, Laurent;et.al.(2016) Third Winfab Scientific Day — Location: UCL, Louvain-la-Neuve (Belgium) (29.January.2016)
FilesWinfabdayabstractGillesScheen1.pdf Open Access Adobe PDF78.07 KBDownloadDetailsAuthorsScheen, G.AuthorRasson, J.AuthorBelaroussi, Y.AuthorPoncelet, O.AuthorRaskin, Jean-PierreUCLouvainAuthorFrancis, LaurentUCLouvainAuthorShow more AffiliationsUCLouvainSST/ICTM/ELEN - Pôle en ingénierie électriqueShow moreCitations APA Chicago FWB Scheen, G., Rasson, J., Belaroussi, Y., Poncelet, O., Majoul, N., Raskin, J.-P., & Francis, L. (2016). Porous Silicon: when void enables new Si application fields. Third Winfab Scientific Day, UCL, Louvain-la-Neuve (Belgium). https://hdl.handle.net/2078.5/228486