High-temperature SOI MOS device processing

Flandre, Denis
(1996) HITEN TIG Meeting 1996 — Location: Paris (France) (24.October.1996)

Files

No attached file found for this publication.

Details

Authors
Affiliations

Citations

  • APA
  • Chicago
  • FWB

Flandre, D. (1996). High-temperature SOI MOS device processing. Proceedings of the HITEN TIG Meeting 1996. HITEN TIG Meeting 1996, Paris (France). https://hdl.handle.net/2078.5/225757