Defect Engineering in n‐Type Oxide Semiconductor TFTsLi, Guoli;He, Jiawei;Flandre, Denis;Liao, Lei(2021) International Conference on Display Technology 2021 (ICDT 2021) — Location: Beijing (China) (30.May.2021)
FilesDefectEngineeringinnTypeOxideSemiconductorTFTs.html Open Access HTML20.38 KBDownloadDetailsAuthorsLi, GuoliSchool of Physics and Electronics, Hunan University, Changsha, ChinaAuthorHe, JiaweiSchool of Physics and Technology, Wuhan University, Wuhan, ChinaAuthorFlandre, DenisUCLouvainAuthorLiao, LeiSchool of Physics and Electronics, Hunan University, Changsha, ChinaAuthorAffiliationsUCLouvainSST/ICTM/ELEN - Pôle en ingénierie électriqueShow moreCitations APA Chicago FWB Li, G., He, J., Flandre, D., & Liao, L. (2021). Defect Engineering in n‐Type Oxide Semiconductor TFTs. International Conference on Display Technology 2021 (ICDT 2021), Beijing (China). https://hdl.handle.net/2078.5/224280