Comparison of self-heating in effects in GAA and SOI devices

Francis, P.;Flandre, Denis;Colinge, Jean-Pierre;Van de Wiele, Fernand
(1995) 25th Solid State Device Research Conference (ESSDERC 1995) — Location: The Hague (the Netherlands) (25.September.1995)

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Authors
  • Francis, P.UCLouvain
    Author
  • Author
  • Colinge, Jean-PierreUCLouvain
    Author
  • Van de Wiele, FernandUCLouvain
    Author
Abstract
Experimental evidence of lesser current reduction caused by self-heating in double-gate GAA transistors, compared to regular SOI MOSFETs, is provided and confirmed by a simple analytical model. The scaling of the buried oxide thickness is discussed in general.
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Francis, P., Flandre, D., Colinge, J.-P., & Van de Wiele, F. (1995). Comparison of self-heating in effects in GAA and SOI devices. Proceedings of the 25th ESSDERC Conference, 225-228. https://hdl.handle.net/2078.5/218787