Experimental evidence of lesser current reduction caused by self-heating in double-gate GAA transistors, compared to regular SOI MOSFETs, is provided and confirmed by a simple analytical model. The scaling of the buried oxide thickness is discussed in general.
Francis, P., Flandre, D., Colinge, J.-P., & Van de Wiele, F. (1995). Comparison of self-heating in effects in GAA and SOI devices. Proceedings of the 25th ESSDERC Conference, 225-228. https://hdl.handle.net/2078.5/218787