NANOSIL network of excellence-silicon-based nanostructures and nanodevices for long-term nanoelectronics applications

Balestra, F.;Parker, E.;Leadley, D.L.;Mantl, S.;Flandre, Denis;et.al.
(2008) Materials Science in Semiconductor Processing — Vol. 11, n° 5-6, p. 148-159 (2008)

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  • Balestra, F.IMEP, Grenoble
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  • Parker, E.Warwick University, UK
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  • Leadley, D.L.Warwick University, UK
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  • Mantl, S.Warwick University, UK
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Abstract
NANOSIL Network of Excellence [NANOSIL NoE web site < www.nanosil-noe.eu >], funded by the European Commission in the 7th Framework Programme (ICT-FP7, no 216171), aims at European scale integration of the excellent European research laboratories and their capabilities in order to strengthen scientific and technological excellence in the field of nanoelectronic materials and devices for terascale integrated circuits (ICs), and to disseminating the results in a wide scientific and industrial community. NANOSIL is exploring and assessing the science and technological aspects of nanodevices and operational regimes relevant to the n+4 technology node and beyond. It encompasses projects on nanoscale CMOS and beyond-CMOS. Innovative concepts, technologies and device architectures are proposed-with fabrication down to the finest features, and utilising a wide spectrum of advanced deposition and processing capabilities, extensive characterization and very rigorous device modeling. This work is carried out through a network of joint processing, characterization and modeling platforms. This critical interaction strengthens European integration in nanoelectronics and will speed up technological innovation for the nanoelectronics of the next two to three decades. (C) 2008 Elsevier Ltd. All rights reserved.
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Citations

Balestra, F., Parker, E., Leadley, D. L., Mantl, S., Dubois, E., Engstrom, o., Clerc, R., Cristoloveanu, S., Kurz, H., Raskin, J.-P., Lemme, M., Ionescu, A., Kasper, E., Karmous, A., Baus, M., Spangenberg, B., Ostling, M., Sangiorgi, E., Ghibaudo, G., & Flandre, D. (2008). NANOSIL network of excellence-silicon-based nanostructures and nanodevices for long-term nanoelectronics applications. Materials Science in Semiconductor Processing, 11(5-6), 148-159. https://doi.org/10.1016/j.mssp.2008.09.017 (Original work published 2008)