We report on the electrical performance of silane-treated silicon nanowires configured as n + – p – n + field effect transistors. The functionalization of the silicon oxide shell with (3-aminopropyl)triethoxysilane controls the formation of the conduction channel in the trapezoidal cross-section nanowires. By carefully adjusting the surface conditioning protocol, robust electrical characteristics were achieved in terms of device-to-device reproducibility for the studied silicon nanowire transistors: the standard deviation displays a fourfold decrease for the threshold voltage together with a sevenfold improvement for the subthreshold slope.
Dutu, C. A., Vlad, A., Reckinger, N., Flandre, D., Raskin, J.-P., & Melinte, S. (2014). Tuning the surface conditioning of trapezoidally shaped silicon nanowires by (3-aminopropyl)triethoxysilane. Applied Physics Letters, 104(2), 023502 (4). https://doi.org/10.1063/1.4861598 (Original work published 2014)