Stress relaxation in Al-Si-Cu thin films and lines

Witvrouw, A.;Proost, Joris;Deweerdt, B.;Roussel, Ph.;Maex, K.
(1995) the Materials Research Society Symposium — Location: Boston - MA (1995)

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Authors
  • Witvrouw, A.
    Author
  • Proost, JorisUCLouvain
    Author
  • Deweerdt, B.
    Author
  • Roussel, Ph.
    Author
  • Maex, K.
    Author
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Witvrouw, A., Proost, J., Deweerdt, B., Roussel, Ph., & Maex, K. (1995). Stress relaxation in Al-Si-Cu thin films and lines. Proceedings, p. 441. https://hdl.handle.net/2078.5/229678