Stress relaxation in Al-Si-Cu thin films and linesWitvrouw, A.;Proost, Joris;Deweerdt, B.;Roussel, Ph.;Maex, K.(1995) the Materials Research Society Symposium — Location: Boston - MA (1995)
FilesNo attached file found for this publication.DetailsAuthorsWitvrouw, A.AuthorProost, JorisUCLouvainAuthorDeweerdt, B.AuthorRoussel, Ph.AuthorMaex, K.AuthorAffiliationsUCLouvainShow moreCitations APA Chicago FWB Witvrouw, A., Proost, J., Deweerdt, B., Roussel, Ph., & Maex, K. (1995). Stress relaxation in Al-Si-Cu thin films and lines. Proceedings, p. 441. https://hdl.handle.net/2078.5/229678