Micro-texture and electromigration-induced drift in electroplated damascene Cu

Proost, Joris; Hirato, T.; Furuhara, T.; Maex, K.; Celis, J-P.

doi:10.1063/1.372258

Micro-texture and electromigration-induced drift in electroplated damascene Cu

Proost, Joris

;

Hirato, T.

;

Furuhara, T.

;

Maex, K.

;

Celis, J-P.

(2000) Journal of Applied Physics — Vol. 87, n° 6, p. 2792-2802 (2000)

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Proost, JorisUCLouvain
Author
Hirato, T.
Author
Furuhara, T.
Author
Maex, K.
Author
Celis, J-P.
Author

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UCLouvain

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Proost, J., Hirato, T., Furuhara, T., Maex, K., & Celis, J.-P. (2000). Micro-texture and electromigration-induced drift in electroplated damascene Cu. Journal of Applied Physics, 87(6), 2792-2802. https://doi.org/10.1063/1.372258 (Original work published 2000)