SOI – a key substrate for RF CMOS
(2015) 5th Korean International Summer School on Nanoelectronics – nano-KISS, More Moore or More than Moore Nano-Devices? — Location: ETRI-DAEJEON (Korea) (14.July.2015)
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Raskin, J.-P. (2015). SOI – a key substrate for RF CMOS. 5th Korean International Summer School on Nanoelectronics – nano-KISS, More Moore or More than Moore Nano-Devices?, ETRI-DAEJEON (Korea). https://hdl.handle.net/2078.5/228465