Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups

Bertrand, Olivier;Schumers, Jean-Marc;Kuppan, Chandrasekar;Marchand-Brynaert, Jacqueline;Gohy, Jean-François;et.al.
(2011) Soft Matter — Vol. 7, n° 15, p. 6891-6896 (2011)

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Authors
  • Bertrand, OlivierUCLouvain
    Author
  • Schumers, Jean-MarcUCLouvain
    Author
  • Kuppan, ChandrasekarUCLouvain
    Author
  • Marchand-Brynaert, JacquelineUCLouvain
    Author
  • Fustin, Charles-Andréorcid-logoUCLouvain
    Author
  • Gohy, Jean-FrançoisUCLouvain
    Author
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Abstract
The synthesis of photocleavable poly(dimethoxynitrobenzyl acrylate)-block-polystyrene block copolymers is described. The UV irradiation of these block copolymers, dissolved in a good solvent for both blocks, selectively cleaves the dimethoxynitrobenzyl protecting groups, leading to carboxylic acid moieties. Since the resulting hydrophilic poly(acrylic acid) block is insoluble in the solvent used, self-assembly of the diblocks into micelles is observed. This light-induced micellization process is further used to trap dyes into the core of the micelles.
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Bertrand, O., Schumers, J.-M., Kuppan, C., Marchand-Brynaert, J., Fustin, C.-A., & Gohy, J.-F. (2011). Photo-induced micellization of block copolymers bearing 4,5-dimethoxy-2-nitrobenzyl side groups. Soft Matter, 7(15), 6891-6896. https://doi.org/10.1039/c1sm05631j (Original work published 2011)