Metallic Source/Drain Architecture for Advanced MOS Technology: an overview of METAMOS results
(2009) 8th Diagnostics & Yield Symposium — Location: Warszaw (Poland) (22.June.2009)
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Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D., Reckinger, N., Tang, X., Halimaoui, A., Rengel, R., Pascual, E., Pouydebasque, A., Wallart, X., Godey, S., Ratajczak, J., Laszcz, A., Katcki, J., Raskin, J.-P., Dambrine, G., et al. (2009). Metallic Source/Drain Architecture for Advanced MOS Technology: an overview of METAMOS results. Proceedings of the 8th Diagnostics & Yield Symposium. Published. 8th Diagnostics & Yield Symposium, Warszaw (Poland). https://hdl.handle.net/2078.5/230769