Simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors

Lorant, Christophe;Descamps, Pierre;De Wilde, Juray
(2014) 1st BeLux workshop on “Coating, Materials, surfaces and Interfaces — Location: Luxembourg (11.September.2014)

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Authors
  • Lorant, ChristopheUCLouvain
    Author
  • Descamps, PierreDow Corning Europe, Seneffe, Belgium
    Author
  • De Wilde, JurayUCLouvain
    Author
Abstract
The simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors is challenging due to the coupling of the fluid dynamics, the chemical reactions and the electric field and the stiffness of the resulting mathematical system. The model equations and the rigorous model reduction to reduce the stiffness are addressed in this paper. Considering pure nitrogen plasma, simulations with two configurations are discussed.
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Lorant, C., Descamps, P., & De Wilde, J. (2014). Simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors. 1st BeLux workshop on “Coating, Materials, surfaces and Interfaces, Luxembourg. https://hdl.handle.net/2078.5/66803