Ex-situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes
(2006) 8th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces — Location: Antwerp (2006)
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Holsteyns, F., Minsier, V., Proost, J., Arnauts, S., Arnauts, S., Brunner, J., Straka, J., & Mertens, P. (2006). Ex-situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes. Proceedings, p. 151. https://hdl.handle.net/2078.5/219853