(2009) ISEF2009, International Symposium on Electromagnetic Fields in Mechatronics, Electrical and Electronic Engineering — Location: Arras, France (10.September.2009)
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Cividjian, G. A.University of Craiova
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Matagne, ErnestUCLouvain
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Abstract
The field modelling becomes simpler if strong field nonuniformities are solved theoretically. The early-obtained formulas for 2-D "corner" permeances, (capacitances or resistances) pertain to right angle configurations. In this paper, using a conformal mapping and analytical approximations, the field in the vicinity of arbitrary angle corner is studied and the corner resistance determined. Obtained results can be applied to a large range of electromagnetic and microelectronic devices. They agree with early-obtained values for right angle corner and with the FEM simulation.
Cividjian, G. A., & Matagne, E. (2009). Resistance of arbitrary angle corner. Proceedings of the International Symposium on Electromagnetic Fields in Mechatronics, Electrical and Electronic Engineering. ISEF2009, International Symposium on Electromagnetic Fields in Mechatronics, Electrical and Electronic Engineering, Arras, France. https://hdl.handle.net/2078.5/151983