In the last few years, many efforts have been made looking for the improvement of the DC and RF performance of MOS transistors. In this scope, Schottky-Barrier transistors appear as very interesting alternative to conventional devices. In this paper we present the non-linear behavior of dopant segregated n-type SB-MOSFETs with 180 nm channel length.
Tinoco, J. C., Urban, C., Emam, M., Mantl, S., Zhao, Q. T., & Raskin, J.-P. (2010). Non-Linear analysis of n-type Schottky-Barrier MOSFETs. Proceedings of the 2010 IEEE International SOI Conference, pp. 76-77. https://hdl.handle.net/2078.5/231077