In-depth investigation of 0.13µm SOI MOSFETs for high-temperature applications
(2004) 5th European Workshop on Ultimate Integration of Silicon - ULIS 2004 — Location: Leuven (Belgium) (11.March.2004)
Files
No attached file found for this publication.
Details
- Authors
- Affiliations
Citations
Kilchytska, V., de Meyer, K., & Flandre, D. (2004). In-depth investigation of 0.13µm SOI MOSFETs for high-temperature applications. Proceedings of the 5th European Workshop on Ultimate Integration of Silicon (ULIS 2004), 163-166. https://hdl.handle.net/2078.5/252638