Self alignment method by buried mask implantation for Double Gate MOS fabrication and nano devices fabrication

Charavel, R., & Raskin, J.-P. (2004). Self alignment method by buried mask implantation for Double Gate MOS fabrication and nano devices fabrication. Proceedings of SPIE - Optical Science, Sensors and Systems Technology, Architecture, Applications, pp. 362-372. https://hdl.handle.net/2078.5/229167