Advanced characterization : an indispensable tool for understanding ultra clean processing

Vandervorst, W;Bender, H;Storm, W;Heyns, M;Bertrand, Patrick;et.al.
(1995) Microelectronic Engineering — Vol. 28, p. 27-34 (1995)

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  • Vandervorst, WKUL
    Author
  • Bender, HIMEC
    Author
  • Storm, WIMEC
    Author
  • Heyns, MIMEC
    Author
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  • Bertrand, PatrickUCLouvain
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Abstract
Economical and environmental considerations have led to the replacement of Ultra Clean Processing by the “Just-Clean-Enough” concept which is based on a fundamental understanding of the effect of contaminants and consequently on defining tolerable limits for the contamination. In this paper an overview is given of the characterisation tools which can be used in this context for metal detection, surface chemistry and roughening and organic contamination.
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Vandervorst, W., Bender, H., Storm, W., Heyns, M., Poleunis, C., & Bertrand, P. (1995). Advanced characterization : an indispensable tool for understanding ultra clean processing. Microelectronic Engineering, 28, 27-34. https://doi.org/10.1016/0167-9317(95)00009-W (Original work published 1995)