This study investigates the mechanism responsible for the electrochemical oscillations during silicon galvanostatic anodizing. Two oscillatory regimes of anodic silica formation in dilute fluoride electrolyte are monitored by combined in-situ curvature measurement and ellipsometry. At lower applied current density, a dense silica film is formed and the oscillations features are similar to those observed in fluoride-free electrolytes. At higher applied current density, a porous silica film is formed and the oscillations progressively reappear after a transition regime without oscillations. The disappearance and the reappearance of the oscillations are associated to variations of the degree of synchronization between the self-oscillating domains. In addition, the similarities between the oscillatory regimes and the persistence of sustained oscillations during the formation of thicker silica indicate that all oscillations arise from a same mechanism that survives the oxide accumulation at the silicon surface.
Blaffart, F., Van Wonterghem, F., Santoro, R., & Proost, J. (2014). In-situ monitoring of electrochemical oscillations during the transition between dense and porous anodic silica formation. Journal of the Electrochemical Society, 161(14), H874-H879. https://doi.org/10.1149/2.0051414jes (Original work published 2014)