Integration of Low Schottky Barrier Source/Drain for Advanced MOS Technology

Dubois, Emmanuel;Darrieu, Guilhem;Krzeminski, C.;Baie, Xavier;Bayot, Vincent;et.al.
(2004) 13TH NID Workshop 2004 — Location: Athens (Greece) (4.February.2004)

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  • Dubois, EmmanuelIEMN, France
    Author
  • Darrieu, GuilhemIEMN, France
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  • Krzeminski, C.IEMN, France
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  • Baie, XavierIEMN, France
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  • Tang, XiaohuiUCLouvain
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  • Reckinger, NicolasUCLouvain
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  • Bayot, VincentUCLouvain
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Dubois, E., Darrieu, G., Krzeminski, C., Baie, X., Tang, X., Reckinger, N., & Bayot, V. (2004). Integration of Low Schottky Barrier Source/Drain for Advanced MOS Technology. Proceedings of the 13TH NID Workshop 2004. 13TH NID Workshop 2004, Athens (Greece). https://hdl.handle.net/2078.5/223010