Nanomechanical tensile testing of metallic thin films
(2010) MICROSCIENCE 2010 — Location: London, UK (28.June.2010)
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Wang, B., Idrissi, H., Colla, M.-S., Coulombier, M., Boé, A., Proost, J., Raskin, J.-P., Pardoen, T., & Schryvers, D. (2010). Nanomechanical tensile testing of metallic thin films. Proceedings of MICROSCIENCE 2010, p. Paper M3.2-0142. https://hdl.handle.net/2078.5/236834