Gate length scaling and microwave performance of double gate nanotransistors
(2005) International Journal of Nanoscience — Vol. 4, n° 5-6, p. 1021-1024 (2005)
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- Abstract
- A detailed analysis of static and dynamic characteristics of deep submicron double and single gate SOI MOSFETs is presented, based on 2D numerical simulations for high frequency analog applications. Results show that although DG MOSFET offers excellent performance with respect to short channel immunity and higher transconductance, it offers nearly two times the value of gate-to-source capacitance as compared to SG devices, thus limiting the cut-off frequency at higher gate voltages. At ultra short channel lengths and low gate overdrive voltages, DG devices show a significant improvement in cut-off frequency compared to SG devices, thus presenting DG nanotransistors as potential candidates for analog microwave applications.
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Kranti, A., Chung, T. M., & Raskin, J.-P. (2005). Gate length scaling and microwave performance of double gate nanotransistors. International Journal of Nanoscience, 4(5-6), 1021-1024. https://doi.org/10.1142/S0219581X05004005 (Original work published 2005)