Quasi-optical technique for sensing bond quality of silicon wafers

Elhawil, A.;Huynen, Isabelle;Raskin, Jean-Pierre;Roda Neve, Cesar;Vounckx, R.;et.al.
(2010) Micro-Optics 2010 — Location: Brussels, Belgium (12.April.2010)

Files

No attached file found for this publication.

Details

Authors
Show more
Abstract
In this paper, we investigate a novel fast and reliable method to check the bonding quality of silicon wafers. It is based on illuminating the wafers with a high frequency waves (110 - 170 GHz) using quasi-optical technique. The reflected energy is used to evaluate the bonding strength. The reported experimental study is compared with the Infrared images.
Affiliations

Citations

Elhawil, A., Huynen, I., Raskin, J.-P., Roda Neve, C., Olbrechts, B., Stiens, J., & Vounckx, R. (2010). Quasi-optical technique for sensing bond quality of silicon wafers. Micro-Optics 2010, Vol. 7716, 77161R (7 pp.). https://doi.org/10.1117/12.853667