RF figures of merit of polysilicon trap-rich layers formed locally by ion amorphization and nanosecond laser annealing

Perrosé, M.;Acosta Alba, P.;Moulin, Maxime;Augendre, E.;Reboh, S.;et.al.
(2023) IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems – SiRF 2023 — Location: Las Vegas, Nevada, USA (22.January.2023)

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  • Perrosé, M.
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  • Acosta Alba, P.
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  • Moulin, MaximeUCLouvain
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  • Augendre, E.
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  • Reboh, S.
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Perrosé, M., Acosta Alba, P., Moulin, M., Augendre, E., Lugo, J., Raskin, J.-P., & Reboh, S. (2023). RF figures of merit of polysilicon trap-rich layers formed locally by ion amorphization and nanosecond laser annealing. IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems – SiRF 2023, Las Vegas, Nevada, USA. https://hdl.handle.net/2078.5/164302