Application of process induced stress to study the mechanical properties of monocrystalline and amorphous silicon thin films (poster pres. by U. Bhaskar)
Bhaskar, U. K., Passi, V., Pardoen, T., & Raskin, J.-P. (2010). Application of process induced stress to study the mechanical properties of monocrystalline and amorphous silicon thin films (poster pres. by U. Bhaskar). Nanobrucken Nanomechanical testing Workshop, INM, Saarbrucken - Germany. https://hdl.handle.net/2078.5/208953