Evolution of the growth stress, stiffness and microstructure of alumina thin films during vapor deposition
(2002) Journal of Applied Physics — Vol. 91, n° 1, p. 204-216 (2002)
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Proost, J., & Spaepen, F. (2002). Evolution of the growth stress, stiffness and microstructure of alumina thin films during vapor deposition. Journal of Applied Physics, 91(1), 204-216. https://doi.org/10.1063/1.1425076 (Original work published 2002)