Laser-recrystallized silicon as a device-worthy material for SOI and 3D integrated circuitsColinge, Jean-Pierre(1984)
FilesColinge.pdf Restricted Access Adobe PDF7.67 MBNo accessDetailsAuthorsColinge, Jean-PierreUCLouvainauthorAffiliationsUCLouvainFSA/ELEC - Département d'électricitéShow moreCitations APA Chicago FWB Colinge, J.-P. (1984). Laser-recrystallized silicon as a device-worthy material for SOI and 3D integrated circuits. https://hdl.handle.net/2078.5/121446