The spontaneous reaction of Cu(hfac) (TMVS) Vapor with DuPont Teflon AF1660
(1996) 189th Meeting of the electrochemical society, symposium on Metallized Plastics: fundamental and applied aspects V — Location: Los Angeles, USA (1996)
Files
No attached file found for this publication.
Details
- Authors
- Abstract
- Preliminary X-ray photoelectron spectroscopic (XPS) and time-of-flight secondary ion mass spectroscopic (TOF-SIMS) measurements have confirmed the reaction of Teflon AF1600 with vapors of copper (hexafluoroacetylacetonate) (trimethyl vinyl silane) [C(hfac)(TMVS)], when exposed in the dark. XPS reveals the deposited copper to be in the Cu*II state, while TOF-SIMS has shown the organometallic to have lost its ligands in bonding to the surface.
- Affiliations
Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada Dept Genie Physique Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada Dept Engn Phys
Citations
Popovici, D., Sacher, E., Meunier, M., Martinu, L., Léonard, D., & Bertrand, P. (1996). The spontaneous reaction of Cu(hfac) (TMVS) Vapor with DuPont Teflon AF1660. Electrochemical Society. Meeting Abstracts, 96(1), 393. https://hdl.handle.net/2078.5/154112 (Original work published 1996)