Technological and Material Challenges for High-Aspect Ratio and Teradot/Inch² Areal Density Structuring of Polyaniline Using Electron Beam Lithography.
(2010) SPIE Scanning Microscopy Conference — Location: Monterey, CA (USA) (17.May.2010)
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Melinte, S. (2010). Technological and Material Challenges for High-Aspect Ratio and Teradot/Inch² Areal Density Structuring of Polyaniline Using Electron Beam Lithography. SPIE Scanning Microscopy Conference, Monterey, CA (USA). https://hdl.handle.net/2078.5/220211