Polymer-matrix nanocomposites bombarded by large AR clusters and low energy Cs ions: Sputtering and topography development
(2018) Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics — Vol. 36, n° 03F118 (2018)
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- Authors
Bailly, Christian 
- Abstract
- In secondary ion mass spectrometry, hybrid materials such as organic matrices loaded with inorganic nanoparticles (NPs) are notoriously difficult to depth profile with any known ion beam, including large Ar clusters, although they display excellent performance with pure organic materials and polymers. To improve their understanding of the detrimental effects of the hybrid material nature on depth profiling, a precise evaluation of the sputtering and roughness induced upon Cs ion and Ar cluster beam bombardment of a series of composite samples was performed. For this purpose, the authors focused on the sputtering of a selection of extruded, hot-pressed polymer-matrix nanocomposite films by large Ar clusters (20keV Ar1000þ–20eV/at and 10keV Ar3000þ–3.3eV/at) and low energy (500eV) Csþ ions. The selected sample coatings were pure polycarbonate (PC; reference), PC with 5wt. % graphene nanoplatelets, PC with 5wt. % Fe3O4 magnetic nanoparticles (MNPs), and PC with 10wt. % graphene oxide decorated with similar MNPs. The original surfaces and crater bottoms obtained after a fixed ion dose were carefully analyzed by stylus profilometry and atomic force microscopy in order to extract crater depth, sputtering yield, and roughness values. The main observation is that the crater roughness strongly increases in all cases when NPs are mixed with the polymer. However, there are specific behaviors depending on the NP inclusion types and the chosen primary beams. The observed effects are tentatively explained on the basis of fundamental studies of atom and cluster-induced sputtering.
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Citations
Edwards, R., Mesfin, H. M., Pospisilova, E., Poleunis, C., Bailly, C., & Delcorte, A. (2018). Polymer-matrix nanocomposites bombarded by large AR clusters and low energy Cs ions: Sputtering and topography development. Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics, 36(03F118). https://doi.org/10.1116/1.5015989 (Original work published 2018)