Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces
(1999) Journal of the Electrochemical Society — Vol. 146, n° 11, p. 4230-4235 (1999)
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Proost, J., Li, H., Conard, T., Boullart, W., & Maex, K. (1999). Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces. Journal of the Electrochemical Society, 146(11), 4230-4235. https://doi.org/10.1149/1.1392619 (Original work published 1999)