Photocleavable block copolymers as precursors for nanoporous thin films
(2009) 238th ACS Meeting — Location: Washington (USA) (16.August.2009)
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Schumers, J.-M., Fustin, C.-A., & Gohy, J.-F. (2009). Photocleavable block copolymers as precursors for nanoporous thin films. PMSE Preprints, 101, 988-989. https://hdl.handle.net/2078.5/93428 (Original work published 2009)