Angle-resolved XPS study of plasma-deposited polystyrene films after oxygen plasma treatment
(2008) Plasma Processes and Polymers — Vol. 5, n° 1, p. 67-75 (2008)
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- Abstract
- Plasma oxidation of plasma deposited polystyrene (pPS) films was performed in an inductively coupled plasma reactor. Reconstruction of the oxygen concentration depth profiles based on angle-resolved XPS data showed that two competitive mechanisms (functionalization and etching) happened during the oxygen plasma treatment. Static water contact angle measurements confirmed this result. Oxidized pPS films were also not stable with time; a loss of hydrophilicity was observed and reorganization of the topmost functionalized surface occurred involving diffusion of oxygen groups from the surface towards the bulk and re-contamination by reaction of trapped radicals with hydrocarbon molecules present in ambient air.
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Haidopoulos, M., Horgnies, M., Mirabella, F., & Pireaux, J.-J. (2008). Angle-resolved XPS study of plasma-deposited polystyrene films after oxygen plasma treatment. Plasma Processes and Polymers, 5(1), 67-75. https://doi.org/10.1002/ppap.200700067 (Original work published 2008)