Functionalized Nanoporous Thin Films From Photocleavable Block Copolymers
(2012) Macromolecular Rapid Communications — Vol. 33, n° 3, p. 199-205 (2012)
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- Abstract
- A polystyrene- block -poly(ethylene oxide) block copolymer bearing a photocleavable junction between the blocks is used to form nanoporous thin fi lms with carboxylic acid functions homogeneously distributed on the pore walls. The presence of the carboxylic acid groups is evidenced by fl uorescence spectroscopy after their reaction with a diazomethane functionalized fluorescent dye. In addition, the initial light-responsivethin film, acting as a photoresist, can be easily patterned to selectively generate porosity in predetermined areas. In that way, fluorescent patterns can be obtained as evidenced by fluorescent microscopy.
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Citations
Schumers, J.-M., Vlad, A., Huynen, I., Gohy, J.-F., & Fustin, C.-A. (2012). Functionalized Nanoporous Thin Films From Photocleavable Block Copolymers. Macromolecular Rapid Communications, 33(3), 199-205. https://doi.org/10.1002/marc.201100739 (Original work published 2012)