Combined in-situ stress and thickness monitoring during electrochemical oxidation of silicon
(2012) 8th International Conference on Porous Semiconductors-Science and Technology — Location: Malaga (25.March.2012)
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Blaffart, F., Santoro, R., & Proost, J. (2012). Combined in-situ stress and thickness monitoring during electrochemical oxidation of silicon. Proceedings of the 8th International Conference on Porous Semiconductors-Science and Technology, p. Abstract O2-03. https://hdl.handle.net/2078.5/163268