Development and characterization of microsystems in thin film SOI technologyIker, François;Raskin, Jean-Pierre(2002) Union Radio-Scientifique Internationale (U.R.S.I.) — Location: Brussels, Belgium (13.December.2002)
FilesNo attached file found for this publication.DetailsAuthorsIker, FrançoisUCLouvainAuthorRaskin, Jean-PierreUCLouvainAuthorAffiliationsUCLouvainFSA/ELEC - Département d'électricitéShow moreCitations APA Chicago FWB Iker, F., & Raskin, J.-P. (2002). Development and characterization of microsystems in thin film SOI technology. Proceedings of the Union Radio-Scientifique Internationale (U.R.S.I.), p. 1 page. https://hdl.handle.net/2078.5/229283